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[ccp4bb] solvent mask with refmac

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CCP4bb <-- 1999 <-- November 1999 <-- 30 November 1999
Previous message:
Subject: Re: 3D LCD and glasses
From: "Bernhard C {- dot -} Lohkamp" bernhard {- at -} CHEM {- dot -} GLA {- dot -} AC {- dot -} UK
Date: 2009-06-02
Next message:
Subject: Postdoctoral position at Karolinska Institutet
From: Jodie Guy Jodie {- dot -} Guy {- at -} KI {- dot -} SE
Date: 2009-06-02


Subject: solvent mask with refmac
From: Ana-Maria Goncalves ana_maria {- dot -} goncalves {- at -} ESRF {- dot -} FR
Date: 2009-06-02

Dear BB,

I'm refining a structure which presents a big hydrophobic cavity where a
strong residual difference negative density can be seen. I presume that
this is an effect of not having a proper solvent mask determined and I
was wondering if there is a way to provide a better mask description to
REFMAC. The resolution of the data is 1.6 A and I have already tried
changing from simple to Babinet scaling, without any improvement. Any
advice/suggestion would be very welcome.

Many thanks,
Ana-Maria



--
Ana-Maria Goncalves
Macromolecular Crystallography Group
European Synchrotron Radiation Facility
B.P. 220, 6 rue Jules Horowitz
F-38043 GRENOBLE CEDEX
FRANCE

Tel: +33 (0) 4.76.88.19.12
Fax: +33 (0) 4.76.88.29.04

CCP4bb navigation

CCP4bb <-- 1999 <-- November 1999 <-- 30 November 1999
Previous message:
Subject: Re: 3D LCD and glasses
From: "Bernhard C {- dot -} Lohkamp" bernhard {- at -} CHEM {- dot -} GLA {- dot -} AC {- dot -} UK
Date: 2009-06-02
Next message:
Subject: Postdoctoral position at Karolinska Institutet
From: Jodie Guy Jodie {- dot -} Guy {- at -} KI {- dot -} SE
Date: 2009-06-02



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