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[ccp4bb] solvent mask with refmac |
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CCP4bb navigationCCP4bb <-- 1999 <-- November 1999 <-- 30 November 1999Subject: solvent mask with refmac From: Ana-Maria Goncalves ana_maria {- dot -} goncalves {- at -} ESRF {- dot -} FR Date: 2009-06-02 Dear BB, I'm refining a structure which presents a big hydrophobic cavity where a strong residual difference negative density can be seen. I presume that this is an effect of not having a proper solvent mask determined and I was wondering if there is a way to provide a better mask description to REFMAC. The resolution of the data is 1.6 A and I have already tried changing from simple to Babinet scaling, without any improvement. Any advice/suggestion would be very welcome. Many thanks, Ana-Maria -- Ana-Maria Goncalves Macromolecular Crystallography Group European Synchrotron Radiation Facility B.P. 220, 6 rue Jules Horowitz F-38043 GRENOBLE CEDEX FRANCE Tel: +33 (0) 4.76.88.19.12 Fax: +33 (0) 4.76.88.29.04 CCP4bb navigationCCP4bb <-- 1999 <-- November 1999 <-- 30 November 1999 |
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